BS-80020CPPS等离子体源
BS-80020CPPS是用于辅助低温(100℃以下等)下塑料基板和胶片成膜的等离子体源。
The plasma source in this product series is specialized for processes with a low temperature, such as plastic film or substrate. The film quality of vacuum deposited film can be improved by deposition assisted by plasma, with lower temperature increases of a substrate. The item can also be used for plasma treatment, such as for surface modification and cleaning. .
本系列产品是专门为等离子源与低温过程,如塑料膜或基板。真空薄膜质量的沉积膜可以通过沉积以等离子体辅助改善,随着衬底温度的升高降低。该项目也可用于等离子体处理,如表面改性和清洗。。
The reflective deposition is made possible by electron beam-excited plasma, while the ARE technique (Activated Reactive Evaporation) promotes a highly effective discharge, in order to enhance the evaporation materials ionization. There are multiple modes of operation, including a CPPS mode, as well as a normal plasma mode.
反射的沉积是由电子束激发的等离子体成为可能,而技术(活性反应蒸发)促进高效放电,为了提高蒸发物质电离。有多种操作模式,包括当前的模式,以及正常的等离子体模式。
Features特性
BS-80020CPPS Plasma Source for Low-temperature Process
This plasma source is specialized for low-temperature process, for example for a plastic substrate/film. Film quality of vacuum deposited film can be improved by plasma assisted deposition with lowering temperature increase of a substrate. And can also be used for plasma treatment such as cleaning and surface modification.
Can form high density oxide films in a low-temperature process.
Reactive deposition by electron beam excited plasma, associated with ion-assistant effects.
Activated Reactive Evaporation (ARE) technique, promoting highly effective discharge above crucible, to enhance ionization of evaporation materials.
Selectable from CPPS mode, for low-temperature process, and normal plasma mode.
Retrofit to an existing vacuum chamber is possible.
技术规格:
zei大放电输出 | 3.2kW (160V, 20A) |
zei大辅助输出功率 | 2kW (200V, 10A) |
工作压力 | 8×10-3 ~ 8×10-2Pa (Ar, O2, N2 气氛) |
放电气体(Ar) | 8 ~ 20mL/分 |
适用控制电源 | BS-92040CPPC |