| 货号 | CAS号 |
|---|---|
| T119195-10g | 12033-62-4 |
| T119195-50g | 12033-62-4 |
| 熔点 | 3360°C |
| 溶解性 | Insoluble in water. |
| 应用 | antalum nitride is used to create barrier or "glue" layers between copper, or other conductive metals, and dielectric insulator films such as thermal oxides. These films are deposited on top of silicon wafers during the manufacture of integrated circuits, to create thin film surface mount resistors and has other electronic applications. |
| 产品介绍 | 钽的氮化物，以1:1结构为主 |
| 别名 | 一氮化钽;Tantalum mononitride |
