产品描述
| 沸点 | 92 °C |
| 折光率 | 1.430 |
| 敏感性 | 对湿度敏感 |
| 存贮条件 | 充氩保存;储存温度2-8℃ |
| 密度 | 1.0800 |
| 应用 | Dichloromethylvinylsilane was used as single molecular precursor for the deposition of β-SiC thin films and β -SiC nanowires by metalorganic chemical vapor deposition on bare Si 100 and Ni-coated Si 100 substrates.Dichloromethylvinylsilane was used in the synthesis and characterization of Tris(1-(dichloro(methyl)silyl)ethyl)borane,monomer. |
| 产品介绍 | Dichloromethylvinylsilane reacts with dimethylsulphide borane to form organosilylborane, which further gets ammonolysized to form the polymer of the SiBCN. |
| 别名 | 乙烯基二氯甲基硅烷;乙烯基甲基二氯硅烷;二氯乙烯基甲基硅烷;二氯甲基乙烯基硅烷;甲基乙烯基二氯基硅烷;Methylvinyldichlorosilane ;Vinylmethyldichlorosilane |
