NIL专利产品
小型纳米压印机
产品简介:
Process is controlled by a programmable PLC with touch screen user interface.
User can customize process parameters.
Wafer and Mold are held by vacuum chuck
UV curable imprint polymer compatible with traditional photolithography process

工艺参数
Wafer size 4 in
Imprintable wafer area 2 in
Imprint pressure 0 - 25 PSI (upgradable to 100 PSI imprint pressure)
Mold substrate size 5 x 0.090 in
Typical imprint throughput < 5 minutes/wafer

设备尺寸及环境要求
                  Controller                     Platform
Dimension         5.8 x 16.5 x 12 in             17 x 16 x 15 in
Weight            18.5 LB                      45 LB
Environment       10 - 35 C, 65%                10 - 35 C, 65%

Facility requirements
Filtered Pressure source 70 - 100 PSI
Vacuum source <-14 PSI
Power 110-220V, 2A, 50/60 Hz
Clean-room class 1000 or better