仪器简介：
1998年Obducat公司并购了在SEM有三十年经验的Camscan，并结合自身在纳米压印设备以及光存储设备的开发经验，研发了电子束刻蚀设备，提供EBR-30kV,EBR-50kV两种不同型号，都配备热场发射电子腔。

技术参数：
Electron gun /
Filament type
Thermal Field Emission (ZrO/C) X/Y Tilt/Shift Magnetic Alignment

Cathode life
Typically 10,000 hrs+

Beam spot size
Down to 8 nm 30 kV, Down to 2nm 50kV

Beam current density
Typically > 1000 A/cm2

Acceleration voltage
30 kV or 50kV

Gun EHT unit
EHT unit includes Suppressor, Extractor, Lens and Filament supplies

Condenser lenses
Integrated E/S Lens in Electron Gun, and Magnetic Condenser Lens

Objective lens
One electromagnetic low aberration final probe forming lens

Stigmator T
wo Octupole Stigmators, to correct both lens and source astigmatism
 
Beam blanker
Electrostatic blanking plates conjugate to writing plane Bandwidth up to 30 MHz. (tr/tf < 6 ns)

Dynamic focus
Iron free coil, ±100 µm range

Beam current drift
< ±0.5% / hr with activated beam current feedback system

Beam apertures
4 selectable by aperture changer mechanism


Maximal travel 100 mm
Drive unit Brush less 3-phase linear motor
Bearing Cross roller bearing
Straightness < 5 µm / 50 mm
Measuring system Integrated laser scale, resolution < 1nm
Position repeatability < ± 6.4 nm
Dynamic position error < ± 3.8 nm
Speed range high resolution 2.5 - 250 µm/s
Speed range low resolution Up to 5 mm/s

Rotation Spindle
Axial rotational error < 0.05 µm
Radial rotational error < 0.05 µm
Radial async. rotation error < 0.015 µm ptp
Rotation speed 1-3000 rpm




主要特点：
General:
Feedback and closed-loop systems guarantees long time exposure stability.
Fast exposure, High beam current from 1 nA to 30 nA,
CLV or CAV exposure method,
Overlay exposure accuracy and DOSE-control,

Mechanics：
Linear motor and stage outside of vacuum chamber
No magnetic/electrostatic or acoustics interference
Brush less sub systems ensure repeatability
Rotation stage on air bearing
Radial async. rotation error less than 15 nm ptp