型号：LB
品牌：伯英
产地：北京
| 产地： | 中国大陆 |
|---|---|
| 供应商性质： | 生产商 |
| 产地类别： | 国产 |
小型LB膜分析仪
除了卷对卷式柔性LB膜分析仪，我们还有传统的小型LB膜分析仪，可实现LB膜的分析与沉积。LB膜槽子面积小，样品少，基片小，采用垂直镀膜方法。
型号为LT-111，Minitrough 小型LB膜分析仪
性价比高，仅需1.5万欧元（不同配置略有增减）。
卷对卷式柔性LB膜分析仪仪器是一种多功能的LB莫分析仪，具有柔性镀膜，刚性镀膜，垂直镀膜，水平镀膜功能。
卷对卷式柔性LB膜分析仪仪器用于在较长的柔性基底（如保鲜膜式柔性带状基底）上连续沉积单分子薄膜，也可把大尺寸刚性衬底粘接在皮带上进行镀膜，可进行无限多次LB薄膜沉积，可控制柔性基底顺时针或逆时针旋转，沉积X,Y,Z多种类型的LB薄膜结构。同时具备垂直镀膜与水平镀膜功能。衬底可以是卷式铝箔、卷式PET塑料薄膜等。设备包含镀膜槽，卷对卷样品传动装置，卷对卷转动滑障与水平移动滑障，表面压探头与镀膜头，自动进样装置：注射泵与蠕动泵，控制器，电脑。
卷对卷式柔性LB膜分析仪液体界面单分子薄膜镀膜仪器可进行无限多次薄膜沉积，可控制柔性基底顺时针或逆时针旋转，沉积x、y、z型结构的薄膜。
小型LB膜分析仪技术指标：
滑障控制有效面积范围：128+2 cm2-440+1 cm2
基底尺寸范围：125х125x4 mm (h-w-t)
镀膜井尺寸：200x180x200 mm (w-d-h)
表面压传感器：灵敏度0.01 mN/m，测量范围0-80 mN/m。
小型LB膜分析仪Langmuir–Blodgett trough ‘LT-111’ is intended
for application of monomolecular films on solid samples according to the Langmuir–Blodgett (LB) technique and for deposition of multimolecular films by corresponding layer-by-layer technique;
for measurement of compression isotherms (without limitation in number of surfactants in multicomponent mixtures);
for application of monomolecular films on solid samples according to the horizontal precipitation (HP) technique;
for experiments on construction mono- and mulimolecular composite coatings on solid surface;
for altering the surface properties (hydrophylic, optical, electrical etc. behavior);
for fundamental research at production of ultrathin films and their application as insulating and protective coatings, elements of molecular electronics, in biological studies for creation of analogs for bilayer lipid membranes etc..
This version features extra-wide dipping well suitable for flat samples of diameter up to 125 mm. That allows experimentation with, for example, silicon wafers directly.
FEATURES
小型LB膜分析仪技术参数：
Number of barriers: | One |
Velocity range of the barrier motion: | 54–210 mm/min (single side comression) |
Full free surface area: | 463+1 cm2 |
Maximum free surface area confined with the barrier: | 440+1 cm2 |
Minimum free surface area confined with the barrier: | 128+2 cm2 |
Compressed (effective) area: | 312 cm2 |
Liquid medium volume: | 1000-1030 cm3 |
Dipping well: | depth 110 mm, widht 130 mm |
Maximum dimensions of the immersed substrate: | 125х125x4 mm (h-w-t) |
Delay between the layers deposition: | 0–100000 s |
Dipper mechanism stroke: | 85 mm (vertical position of the unit can be adjusted manually) |
Dipper mechanism velocity range: | 0.12–70 mm/min, step of the velocity change 0.1 mm/min |
Deposition rate: | 0.002 to 2 mm/min |
Surface tension sensor: | Wilhelmy plate 2 cm2, accuracy ~0.1 mN/m (vertical position of the sensor can be adjusted manually) |
Number of surafce tension sensors: | One |
Sensitivity of the surface tension sensor: | 0.05 mN/m |
Working range of the surface tension sensor: | 0-80 mN/m (stepped and fine adjustment of the range are available) |
Overall dimensions: | Trough with mounted rig - 400x200x250 mm (w-d-h); Control unit - 220x165x105 mm (w-d-h); Weight 7/8 kg. |
Supply voltage: | 220 V 50 Hz |
Power consumption: | not more than 40 W |
Additional accessories: |
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TECHNIQUES
卷对卷式LB膜分析仪技术：
| Deposition of X-type LB film |
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| Deposition of Y-type LB film |
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| Deposition of Z-type LB film |
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| Horizontal precipitation (HP) method (by liquid medium draining) provides surface modification by extremely uniform and homogenous monolayer films (see, for examplethis paper). HP method allows transferring of monolayer films at various surfaces simultaneously from huge variety of surfactants (both in solid and liquid state) despite of polar head structure. The process of deposition is simple and fast. In particular, the surface of metallized silicon wafer can be modified by HP method within 3-5 minutes. |
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| Roll-To-Roll deposition technique engages additional accessories in the set of LB trough LT-310 to deposit monomolecular film on tape (continuous deposition on flexible substrate). In LT-310, extraction angle of the exiting portion of tape may be adjusted in range 30-90owith step 5o |
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