| 货号 | CAS号 |
|---|---|
| E156231-100ml | 3388-04-3 |
| E156231-25ML | 3388-04-3 |
| E156231-500ML | 3388-04-3 |
| 沸点 | 310 °C |
| 折光率 | 1.4490 to 1.4530 |
| 敏感性 | 对湿度敏感 |
| 存贮条件 | 充氩保存 |
| 密度 | 1****** |
| 应用 |
Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane was used as an adhesion promoter during the fabrication of: · a photoacid generator activated by two photon excitation. · nanoscale polymeric structures (width: 65 nm) using 520 nm femtosecond pulse excitation Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane may be used as a precursor to form SiCOH film via sol-gel. The silane may be used to functionalize alumina nanoparticles towards the fabrication of polyamide 12/alumina nanocomposites. 4 Basalt fibers were functionalized with this silane and its consequent effect on the fabrication of basalt fiber-epoxidized vegetable oil matrix composite materials was analyzed |
| 别名 | 三甲氧基[2-(7-氧杂二环[4.1.0]庚-3-基)乙基]硅烷;2-(7-氧杂二环[4.1.0]庚-3-基)乙基-三甲氧基硅烷;3-(2-三甲氧基硅基乙基)氧化环己烯;Trimethoxy[2-(7-oxabicyclo[4.1.0]heptan-3-yl)ethyl]silane |
