工业用水标准-分析测试百科网

DB2101/T 0012.3-2019 沈阳市行业用水定额第三部分啤酒制造行业用水定额

Industry Water Quotas of Shenyang City Part 3 Water Quotas of Beer Manufacturing Industry

ICS: 13.060.25
CCS: P41
发布: 2019-12-02
实施: 2020-01-02

DB2101/T 0012.2-2019 沈阳市行业用水定额第二部分火力发电行业用水定额

Shenyang Industrial Water Quotas Part II Thermal Power Industry Water Quotas

ICS: 13.060.25
CCS: P41
发布: 2019-12-02
实施: 2020-01-02

DB2101/T 0012.5-2019 沈阳市行业用水定额第五部分医药制品行业用水定额

Industry Water Quotas in Shenyang Part V Water Quotas for Pharmaceutical Products Industry

ICS: 13.060.25
CCS: P41
发布: 2019-12-02
实施: 2020-01-02

DB2101/T 0012.1-2019 沈阳市行业用水定额第一部分纯碱制造行业用水定额

Shenyang Industrial Water Quotas Part 1 Soda Ash Manufacturing Industry Water Quotas

ICS: 13.060.25
CCS: P41
发布: 2019-12-02
实施: 2020-01-02

DB2101/T 0012.4-2019 沈阳市行业用水定额第四部分烧碱制造行业用水定额

Industry Water Quotas in Shenyang City Part IV Water Quotas for Caustic Soda Manufacturing Industry

ICS: 13.060.25
CCS: P41
发布: 2019-12-02
实施: 2020-01-02

DB62/T 2987.2-2019 行业用水定额第2部分工业用水定额

Industrial Water Quotas Part 2 Industrial Water Quotas

ICS: 13.060.25
CCS: P 40
发布: 2019-03-07
实施: 2019-04-01

T/SDPEA 0003-2018 反渗透浓水膜法处理及回收利用方法

本方法规定了反渗透浓水膜法处理及回收利用方法中的常用处理工艺及推荐工艺、工艺参数选择、工艺设备设计等基本技术要求，其余常规设备设计可参照相应技术规范要求。本推荐方法适用于处理以地表水（IV）、地下水（III）或其他经处理后具有回用价值的水等为原水,经预处理后进入反渗透系统制淡水后产生的反渗透浓水。本方法推荐工艺适用氯化钠作为生产原料的化工企业。

The treatment and recycling method of Condensed Water from RO System by membrane

ICS: 13.060.25
CCS: D441
发布: 2018-11-05
实施: 2019-07-12

ASTM D5127-13(2018) 电子和半导体行业超纯水标准指南

1.1 This guide provides recommendations for water quality related to electronics and semiconductor-industry manufacturing. Seven classifications of water are described, including water for line widths as low as 0.032 µm. In all cases, the recommendations are for water at the point of distribution (POD). 1.2 Water is used for washing and rinsing of semiconductor components during manufacture. Water is also used for cleaning and etching operations, making steam for oxidation of silicon surfaces, preparing photomasks, and depositing luminescent materials. Other applications are in the development and fabrication of solid-state devices, thin-film devices, communication lasers, light-emitting diodes, photo-detectors, printed circuits, memory devices, vacuum-tube devices, or electrolytic devices. 1.3 Users needing water qualities different from those described here should consult other water standards, such as Specification D1193 and Guide D5196. 1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use. 1.5 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

Standard Guide for Ultra-Pure Water Used in the Electronics and Semiconductor Industries