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Instrument specifications
| Microscope | Standard: Nikon Eclipse® Ti-E microscope base Standard: Standard microscope operation outside of LCM operating software Optional: Binoculars, CFI 10x eyepieces |
| Lasers | Standard: Infrared (IR) Capture Laser: solid-state, near-IR (810 nm) Optional: Basic UV Cutting Laser: solid-state, passive Q-switched, diode-pumped (355 nm) Optional: Enhanced UV Cutting Laser: solid-state, diode-pumped Q-switched (345 nm) with adjustable laser current (0 –100%) and pulse frequency (10 – 5000 Hz) |
| Illumination | Standard: High-intensity LED illumination system Optional: Nikon Diascopic Illumination Tower for contrast imaging (100 W halogen lamp) |
| Objectives | Standard: 2x, 10x, and 40x Nikon CFI60 objectives Optional: 4x, 20x, 60x, 100x dry and 100x oil Nikon CFI60 objectives |
| Stage | Standard: Motorized, trackball-actuated in X and Y axes with 1 μm precision Standard: Stage insert for three 75 mm x 25 mm slides Optional: Stage insert for large-format slides; two positions, adjustable to 75 mm x 25 mm, 75 mm x 38 mm, 75 mm x 50 mm Optional: Stage insert for petri dish: 50 mm x 7 mm |
| Contrast Methods | Standard: Bright-field Optional: Phase contrast (PhL, Ph1, Ph2) Optional: Differential interference contrast (DIC), Senarmont method (rotating polarizer) |
| Dimensions | 30“ (D) x 22“ (W) x 29“ (H) |
| Work Surface Required | 36“ x 72“ (92 cm x 183 cm), 33“ (80 cm) vertical clearance |
| Power | 100 – 240 VAC, 50 – 60 Hz; 600 W |
| Operating Temperature | 18 – 30°C |
| Operating Humidity | <60% relative humidity (non-condensing) |
| Altitude | For use up to 6,600 ft (2,000 m) |
| Computer Requirements |
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| Other Features | For a full list of features and specifications, see the ArcturusXT™ Product Brochure |