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货号：10300101 Evolution 300 Security UV-Vis Spectrophotometer
| 产品规格 | - |
|---|---|
| 准确度 | ±0.004A at 1A, ±0.004A at 2A, ±0.006A at 3AÅ |
| 准确度（光度） | ±0.004A at 1A, ± 0.004A at 2A, ± 0.006A at 3A |
| 基线平坦度 | ±0.0015A (200-800nm), 2.0nm SBW, smoothed |
| 射束几何形状 | Dual-Beam; Quartz Coated |
| 认证/合规 | 21 CFR Part 11 and audit-proof IQ/OQ/PQ documentation. ISO 9001:2000 |
| 连接 | RS-232 |
| 深度（英制） | 21 in. |
| 深度（公制） | 53 cm |
| 描述 | Evolution 300 Security UV-Vis Spectrophotometer |
| 检测器类型 | Dual Matched Silicon Photodiodes |
| 漂移 | <0.0005Abs/hr, 500 nm, 2.0 nm SBW, 2hr warm-up |
| Electrical Requirements | 100/240 V 50/60 Hz |
| 高度（英制） | 15 in. |
| 高度（公制） | 38 cm |
| 赫兹 | 50/60 Hz |
| 包括 | VisionSecurity Software, User Guide and USB Cable |
| 物品描述 | 300 PC w/VisionSecurity Software |
| 接口 | Computer Control |
| 灯 | Xenon Flash Lamp Typical lifetime: >5 years, longer if not using live signal Warrenty period: 3 year source replacement warrenty |
| zei小数据间隔 | 0.5 nm |
| 单色仪 | Modified Ebert |
| 噪声 | Photometric:0A:<0.00018 A1A: <0.00022 A2A: <0.00050 A500 nm, 2.0 nm SBW, RMS |
| 光学设计 | Modified EbertDouble beam with sample and reference cuvette/accessory positions |
| 路径长度（公制） | Up to 100 mm cuvettes |
| Pharmacopoeia Compliance Testing | Resolution (Toluene in Hexane): Peak/Trough Ratio >2.0Photometric Accuracy (60mg/L K2Cr2O7): <±0.01 A relative to calibrated sealed standardStray Light: <0.13 %T at 198 nm with KCl per EP220 nm: <0.01%T NaI (behaves identically to KI for USP)Wavelength Accuracy: ±0.20 nm (546.11 nm Hg emission line), ±0.30 nm 190–900 nmWavelength Repeatability: Peak separation of repetitive scanning of Hg line source <0.10 nm |
| Photometric Accuracy Including Standard Tolerance | 1A: ±0.008 A2A: ±0.010 A3A: ±0.018 A |
| Photometric Display | ±6 A |
| Photometric Range | >4 A |
| Photometric Readout | Absorbance, % Transmittance, % Reflectance, Concentration |
| Photometric Repeatability | 1A: ±0.0025 A |
| 范围（光度） | >4A |
| 分离度（甲苯/己烷） | Peak/Trough >2.0 at 0.5nm SBW |
| Scan Ordinate Modes | Absorbance, % Transmittance, % Reflectance, Concentration, 1st-4th Derivative |
| 扫描速度. | 1 - 3,800 nm/min |
| 光谱带宽 | Variable 0.5; 1.0; 1.5; 2.0; 4.0 nm |
| 杂散光 | 198 nm: 2.9 A KCl220 nm: 4.2 A NaI340 nm: 4.3 A NaNO2 |
| 系统要求 | At least Windows XP |
| 电压 | 100/240 V |
| 波长精度 | ±0.20 nm (546.11 nm Hg emission line); ±0.3 nm for 190 - 900 nm |
| Wavelength Data Interval | 10, 5, 2, 1, 0.5, 0.2, 0.1, 0.05 nm |
| 波长范围 | 190 to 1100nm |
| 波长重复性 | Standard deviation of 10 measurements <0.05 nm |
| 波长扫描速度 | 3800, 2400, 1200, 600, 240, 120, 60, 30, 10, 5, 1 nm/min Intelliscan |
| 重量（英制） | 48.4 lb. |
| 重量（公制） | 22 kg |
| 宽度（英制） | 24 in. |
| 宽度（公制） | 61 cm |
货号：10300201 Evolution 300 PC UV-Vis Spectrophotometer
| 产品规格 | - |
|---|---|
| 准确度 | ±0.004A at 1A, ±0.004A at 2A, ±0.006A at 3AÅ |
| 准确度（光度） | ±0.004A at 1A, ± 0.004A at 2A, ± 0.006A at 3A |
| 基线平坦度 | ±0.0015A (200-800nm), 2.0nm SBW, smoothed |
| 射束几何形状 | Dual-Beam; Quartz Coated |
| 认证/合规 | 21 CFR Part 11 and audit-proof IQ/OQ/PQ documentation. ISO 9001:2000 |
| 连接 | RS-232 |
| 深度（英制） | 21in. |
| 深度（公制） | 53cm |
| 描述 | Evolution 300 PC UV-Vis Spectrophotometer |
| 检测器类型 | Dual Matched Silicon Photodiodes |
| 漂移 | <0.0005Abs/hr, 500 nm, 2.0 nm SBW, 2hr warm-up |
| Electrical Requirements | 100/240V 50/60Hz |
| 高度（英制） | 15in. |
| 高度（公制） | 38cm |
| 赫兹 | 50/60Hz |
| 包括 | VisionSecurity Software, User Guide and USB Cable |
| 物品描述 | 300 PC w/VisionPro Software |
| 接口 | Computer Control |
| 灯 | Xenon Flash Lamp Typical lifetime: >5 years, longer if not using live signal Warranty period: 3 year source replacement warranty |
| zei小数据间隔 | 0.5nm |
| 单色仪 | Modified Ebert |
| 噪声 | Photometric:0A:<0.00018 A1A: <0.00022 A2A: <0.00050 A500 nm, 2.0 nm SBW, RMS |
| 光学设计 | Modified EbertDouble beam with sample and reference cuvette/accessory positions |
| 路径长度（公制） | Up to 100mm cuvettes |
| Pharmacopoeia Compliance Testing | Resolution (Toluene in Hexane): Peak/Trough Ratio >2.0Photometric Accuracy (60mg/L K2Cr2O7): <±0.01 A relative to calibrated sealed standardStray Light: <0.13 %T at 198 nm with KCl per EP220 nm: <0.01%T NaI (behaves identically to KI for USP)Wavelength Accuracy: ±0.20 nm (546.11 nm Hg emission line), ±0.30 nm 190–900 nmWavelength Repeatability: Peak separation of repetitive scanning of Hg line source <0.10 nm |
| Photometric Accuracy Including Standard Tolerance | 1A: ±0.008 A2A: ±0.010 A3A: ±0.018 A |
| Photometric Display | ±6 A |
| Photometric Range | >4A |
| Photometric Readout | Absorbance, % Transmittance, % Reflectance, Concentration |
| Photometric Repeatability | 1A: ±0.0025 A |
| 范围（光度） | >4A |
| 分离度（甲苯/己烷） | Peak/Trough >2.0 at 0.5nm SBW |
| Scan Ordinate Modes | Absorbance, % Transmittance, % Reflectance, Concentration, 1st-4th Derivative |
| 扫描速度. | 1 to 3800nm/min |
| 光谱带宽 | Variable 0.5; 1.0; 1.5; 2.0; 4.0 nm |
| 杂散光 | 198 nm: 2.9 A KCl220 nm: 4.2 A NaI340 nm: 4.3 A NaNO2 |
| 系统要求 | At least Windows XP |
| 电压 | 100/240V |
| 波长精度 | ±0.20nm (546.11nm Hg emission line); ±0.3nm for 190 to 900nm |
| Wavelength Data Interval | 10, 5, 2, 1, 0.5, 0.2, 0.1, 0.05 nm |
| 波长范围 | 190 to 1100nm |
| 波长重复性 | Standard deviation of 10 measurements <0.05 nm |
| 波长扫描速度 | 3800, 2400, 1200, 600, 240, 120, 60, 30, 10, 5, 1 nm/min Intelliscan |
| 重量（英制） | 48.4lb. |
| 重量（公制） | 22kg |
| 宽度（英制） | 24in. |
| 宽度（公制） | 61cm |
货号：10300501 Evolution 300 PC UV-Vis Spectrophotometer, No Software
| 产品规格 | - |
|---|---|
| 准确度 | ±0.004A at 1A, ±0.004A at 2A, ±0.006A at 3AÅ |
| 准确度（光度） | ±0.004A at 1A, ± 0.004A at 2A, ± 0.006A at 3A |
| 基线平坦度 | ±0.0015A (200-800nm), 2.0nm SBW, smoothed |
| 射束几何形状 | Dual-Beam; Quartz Coated |
| 认证/合规 | 21 CFR Part 11 and audit-proof IQ/OQ/PQ documentation. ISO 9001:2000 |
| 连接 | RS-232 |
| 深度（英制） | 21 in. |
| 深度（公制） | 53cm |
| 描述 | Evolution 300 PC UV-Vis Spectrophotometer, No Software |
| 检测器类型 | Dual Matched Silicon Photodiodes |
| 漂移 | <0.0005Abs/hr, 500 nm, 2.0 nm SBW, 2hr warm-up |
| Electrical Requirements | 100/240V 50/60Hz |
| 高度（英制） | 15 in. |
| 高度（公制） | 38cm |
| 赫兹 | 50/60Hz |
| 包括 | VisionSecurity Software, User Guide and USB Cable |
| 物品描述 | 300 PC, No Software |
| 接口 | Computer Control |
| 灯 | Xenon Flash Lamp Typical lifetime: >5 years, longer if not using live signal Warrenty period: 3 year source replacement warrenty |
| zei小数据间隔 | 0.5nm |
| 单色仪 | Modified Ebert |
| 噪声 | Photometric:0A:<0.00018 A1A: <0.00022 A2A: <0.00050 A500 nm, 2.0 nm SBW, RMS |
| 光学设计 | Modified EbertDouble beam with sample and reference cuvette/accessory positions |
| 路径长度（公制） | Up to 100mm cuvettes |
| Pharmacopoeia Compliance Testing | Resolution (Toluene in Hexane): Peak/Trough Ratio >2.0Photometric Accuracy (60mg/L K2Cr2O7): <±0.01 A relative to calibrated sealed standardStray Light: <0.13 %T at 198 nm with KCl per EP220 nm: <0.01%T NaI (behaves identically to KI for USP)Wavelength Accuracy: ±0.20 nm (546.11 nm Hg emission line), ±0.30 nm 190–900 nmWavelength Repeatability: Peak separation of repetitive scanning of Hg line source <0.10 nm |
| Photometric Accuracy Including Standard Tolerance | 1A: ±0.008 A2A: ±0.010 A3A: ±0.018 A |
| Photometric Display | ±6 A |
| Photometric Range | >4 A |
| Photometric Readout | Absorbance, % Transmittance, % Reflectance, Concentration |
| Photometric Repeatability | 1A: ±0.0025 A |
| 范围（光度） | >4A |
| 分离度（甲苯/己烷） | Peak/Trough >2.0 at 0.5nm SBW |
| Scan Ordinate Modes | Absorbance, % Transmittance, % Reflectance, Concentration, 1st-4th Derivative |
| 扫描速度. | 1 to 3800nm/min |
| 光谱带宽 | Variable 0.5; 1.0; 1.5; 2.0; 4.0 nm |
| 杂散光 | 198 nm: 2.9 A KCl220 nm: 4.2 A NaI340 nm: 4.3 A NaNO2 |
| 系统要求 | At least Windows XP |
| 电压 | 100/240V |
| 波长精度 | ±0.20nm (546.11nm Hg emission line); ±0.3nm for 190-900nm |
| Wavelength Data Interval | 10, 5, 2, 1, 0.5, 0.2, 0.1, 0.05 nm |
| 波长范围 | 190 to 1100nm |
| 波长重复性 | Standard deviation of 10 measurements <0.05 nm |
| 波长扫描速度 | 3800, 2400, 1200, 600, 240, 120, 60, 30, 10, 5, 1 nm/min Intelliscan |
| 重量（英制） | 48.4 lb. |
| 重量（公制） | 22kg |
| 宽度（英制） | 24 in. |
| 宽度（公制） | 61cm |