产品描述
RR3
Resist Remover RR3 is an aqueous Tetramethylammonium Hydroxide stripping solution intended
to remove photoresist from the surface of a substrate.
Properties
♦ Main component: aqueous TMAH
♦ Boiling temperature (°C): 100
♦ Appearance: clear liquid with foam
♦ Specific gravity at 25°C (g/cm³): 1.00
♦ Guaranteed shelf life at 25°C storage (years): >3
Processing
1 Pour the solution into the resist stripping tank.
2 Maintain the solution at room temperature under an exhaust hood.
3 Place the resist-coated substrate in the solution for 2-5 minutes with slight agitation.
4 Rinse the substrate in deionized water until the water resistivity reaches the prescribed limit.
