返回 ETD-650MS磁控溅射仪 返回 ETD-650MS磁控溅射仪 
ETD-650M型磁控溅射仪是我公司研制开发的一款经济实用的袖珍型高真空磁控溅射设备，更适合各科研及教育机构实验室的中试验需求。系统主要由溅射真空室、永磁磁控溅射靶（强/弱磁靶）、光纤旋转台（定制）、直流电源、工作气路、抽气系统、循环水系统、膜厚监测系统、真空测量、电控系统及安装机台等部分组成。
真空系统：涡轮分子泵，抽速为300L/s 前级机械泵：抽速为4L/s，带防返油电磁阀及油污过滤器 真空测量：采用复合真空计监测真空
ETD-650M magnetron sputtering instrument
It is an economical and practical pocket magnetron sputtering equipment developed by our company, which is more suitable for the needs of laboratories in various scientific research and educational institutions. The system is mainly composed of sputtering vacuum chamber, permanent magnet magnetron sputtering target (strong / weak magnetic target), fiber optic rotary table (custom), DC power supply, working gas circuit, pumping system, circulating water system, film thickness monitoring system, vacuum measurement, electronic control system and installation machine and so on.
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