BS ISO 15573:1998
能量在80KeV和300KeV之间的辐射处理用电子束设备剂量测定操作规程

Practice for dosimetry in an electron-beam facility for radiation processing at energies between 80 keV and 300 keV

被代替

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标准号

BS ISO 15573:1998

发布

1999年

发布单位

英国标准学会

替代标准

BS ISO 15573:1999

当前最新

BS ISO 15573:1998(2000)

 

 

被代替标准

97/703091 DC:1997

适用范围

1 This practice covers dosimetric procedures to be followed to determine the performance of low energy (300 keV or lest) single-gap electron beam radiation processing facilities. Other practices and procedures related to facility characterization, product qualification, and routine pro-cessing are also discussed. 2 The electron energy range covered in this practice is from 80 keV to 300 keV. Such electron beams can be generated by single-gap self-contained thermal filament or plasma source accelerators. 3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.

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