产品描述 GL4/6 R&D Multi-functional NIL machine for R&D ➢Multi-function NIL machine for R&D and small volume production ➢Easy switch between different NIL configurations, flxibilities for R&D ➢Functions: High resolution NIL on spin-coated substrates, Puddle dispensed NIL for Micro molding processes, NIL on curved or spherical surfaces GL6/8/12 CLIV High resolution NIL machine for mass production ➢NIL machine equipped with GermanLitho patented CILV technology for mass production ➢NIL on spin-coated substrates for high resolution and high aspect ratio nanostructures ➢Automatic working stamp replication, imprinting and demolding processes, excelent imprint uniformity over large area ➢Better than 40nm resolution, 10:1 aspectration, 20nm residual layer thickness GL8 MLA NIL machine for microlens array production ➢Mass production NIL machine for micro-molding of microlens array or diffuser processes ➢Automatic working stamp replication, imprinting and demolding processes, resist dispense integrated ➢Active control of gap and parallelism between stamp and substrate, excelent TTV ➢Alignment for wafer stacking processes