【技术特点】-- ETD-3000离子溅射仪

ETD-3000型离子溅射仪外观亮丽做工精致，旋钮式定时器档位清晰，手感舒适；特殊定制的真空指示和电流指示表头沉稳大气，具有欧洲典雅风范；前面板上的微泄漏气阀门可以连接多种气体；调节溅射电流大小，成膜速度快，质量好；高压输出可使成膜更加牢固快速。功能控制和定时皆由CPU调度，使用范围广。

工作时结合内部自动控制电路很容易控制真空室压强、电离电流及选择所需的电离气体，获得最佳镀膜效果。

配有高位定性的飞跃真空泵

Bright appearance of ETD-3000 type ion sputtering instrument

Fine workmanship, knob timer gear clear, comfortable hand, special custom vacuum indication and current indication head calm atmosphere, with European elegant demeanor; micro leakage valve on the front panel can connect a variety of gas; adjust the size of sputtering current, fast film formation speed, good quality; high voltage output film forming firm Solid and fast. Functional control and timing are all scheduled by CPU, with a wide range of applications.

It is easy to control the vacuum chamber pressure, ionization current and choose the required ionization gas when working in conjunction with the internal automatic control circuit, so as to achieve the best coating effect.

Vacuum pump equipped with high quality

【技术特点对用户带来的好处】-- ETD-3000离子溅射仪

【典型应用举例】-- ETD-3000离子溅射仪