制剂
注射用两性霉素B
杂质
质C15002000 分钟填料品牌: XBridge shield RPl8、 AQua C18等,可分离杂质B和杂质D 两性霉素B303nm杂质A002000050000b010a0°i1500°2000-250030030400045005000500600两性霉素B杂质杂质B+杂质D杂质C 5001000150020002500300035004000450050.00 填料品牌: CAPCELL PAK C18MGⅡ、 Ultimate LPC18、 Inspire C18等,杂质B和杂质D同时洗脱。2.杂质结构杂质A(两性霉素A)OH OHCHHOOH C47H75NO17926.11 杂质BOH OHNH1R-氧-甲基两性霉素B 杂质C OH OH O CHCH3 C49H7NO17952.15 1-氧-乙基两性霉素B杂质DOCH3HCH OH OH OH Ou CH3 C4gH75NO17938.12 1S-氧-甲基-两性霉素B杂质ECH3H,C C4gH73NO18952.10 33-(3-甲酰基)-两性霉素B