Fine ceramics (advanced ceramics, advanced technical ceramics). Test method for crystalline quality of single-crystal thin film (wafer) using XRD method with parallel X-ray beam
What is ISO 22278 about?
ISO 22278 specifies the test method for measuring the crystalline quality of single-crystal thin film (wafer) using the XRD method with a parallel X-ray beam.
ISO 22278 applies to all of the single-crystal thin film (wafer) as bulk or epitaxial layer structure.
Who is ISO 22278 for?
ISO 22278 on crystalline quality of the single-crystal thin film is useful for:
Ceramic manufacturers
Mechanical engineers