This part of IEC 62047 specifies descriptions of trench structure and needle structure in a micrometer scale. In addition, it provides examples of measurement for the geometry of both structures. For trench structures, this standard applies to structures with a depth of 1 µm to 100 µm; walls and trenches with respective widths of 5 µm to 150 µm; and aspect ratio of 0,006 7 to 20. For needle structures, the standard applies to structures with three or four faces with a height, horizontal width and vertical width of 2 µm or larger, and with dimensions that fit inside a cube with sides of 100 µm. This standard is applicable to the structural design of MEMS and geometrical evaluation after MEMS processes.
IEC 62047-26-2016由国际电工委员会 IX-IEC 发布于 2016-01。
IEC 62047-26-2016 在中国标准分类中归属于: L40 半导体分立器件综合,在国际标准分类中归属于: 31.080.01 半导体器分立件综合,31.080.99 其他半导体分立器件,31.220.01 机电元件综合。
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