IEC 62047-14:2012
半导体装置.微电机装置.第14部分:金属薄膜材料的成型极限测量方法

Semiconductor devices - Microelectromechanical devices - Part 14: Forming limit measuring method of metallic film materials


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标准号
IEC 62047-14:2012
发布日期
2012年02月
实施日期
2012年02月29日
废止日期
中国标准分类号
L40
国际标准分类号
31.080.01;31.080.99;31.220.01
发布单位
国际电工委员会
被代替标准
IEC 47F/108/FDIS:2011
适用范围
This part of IEC 62047 describes definitions and procedures for measuring the forming limit of metallic film materials with a thickness range from 0@5 ?? to 300 ??. The metallic film materials described herein are typically used in electric components@ MEMS and micro-devices. When metallic film materials used in MEMS (see 2.1.2 of IEC 62047-1:2005) are fabricated by a forming process such as imprinting@ it is necessary to predict the material failure in order to increase the reliability of the components. Through this prediction@ the effectiveness of manufacturing MEMS components by a forming process can also be improved@ because the period of developing a product can be reduced and manufacturing costs can thus be decreased. This standard presents one of the prediction methods for material failure in imprinting process.

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